Email this article Plasma-chemical synthesis of transparent dielectric Si–C–O–H films from trimethylphenoxysilane
- Authors: Ermakova E.N.1, Rumyantsev Y.M.1, Rakhlin V.I.2, Kosinova M.L.1
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Affiliations:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch
- Irkutsk Institute of Chemistry, Siberian Branch
- Issue: Vol 50, No 3 (2016)
- Pages: 224-227
- Section: Short Communications Plasma Chemistry
- URL: https://bakhtiniada.ru/0018-1439/article/view/156977
- DOI: https://doi.org/10.1134/S0018143916030085
- ID: 156977
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About the authors
E. N. Ermakova
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Author for correspondence.
Email: ermakova@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
Yu. M. Rumyantsev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: ermakova@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
V. I. Rakhlin
Irkutsk Institute of Chemistry, Siberian Branch
Email: ermakova@niic.nsc.ru
Russian Federation, ul. Favorskogo 1, Irkutsk, 664033
M. L. Kosinova
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: ermakova@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
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