The Influence of the InAlAs Layer Surface Morphology on the Temperature Dependence of Parameters of Au/Ti/n-InAlAs(001) Schottky Diodes
- 作者: Chistokhin I.B.1, Aksenov M.S.1,2, Valisheva N.1, Dmitriev D.V.1, Marchishin I.V.1, Toropov A.I.1, Zhuravlev K.S.1,2
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隶属关系:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State University
- 期: 卷 45, 编号 2 (2019)
- 页面: 180-184
- 栏目: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208227
- DOI: https://doi.org/10.1134/S106378501902024X
- ID: 208227
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详细
Growth-related structural defects present on the surface of InAlAs layers grown by molecular beam epitaxy on InP(001) substrates influence the temperature dependences of the current–voltage characteristics of Au/Ti/InAlAs Schottky barriers. It is established that these defects in the form of pits cause the appearance of regions with reduced barrier height. At a surface density of ≥107 cm–2, these defects significantly influence the parameters of the Schottky barriers at temperatures below 200 K.
作者简介
I. Chistokhin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090
M. Aksenov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University
编辑信件的主要联系方式.
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090; Novosibirsk, 630090
N. A. Valisheva
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090
D. Dmitriev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090
I. Marchishin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090
A. Toropov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090
K. Zhuravlev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University
Email: m.se.aksenov@gmail.com
俄罗斯联邦, Novosibirsk, 630090; Novosibirsk, 630090
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