The Influence of the InAlAs Layer Surface Morphology on the Temperature Dependence of Parameters of Au/Ti/n-InAlAs(001) Schottky Diodes


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Resumo

Growth-related structural defects present on the surface of InAlAs layers grown by molecular beam epitaxy on InP(001) substrates influence the temperature dependences of the current–voltage characteristics of Au/Ti/InAlAs Schottky barriers. It is established that these defects in the form of pits cause the appearance of regions with reduced barrier height. At a surface density of ≥107 cm–2, these defects significantly influence the parameters of the Schottky barriers at temperatures below 200 K.

Sobre autores

I. Chistokhin

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090

M. Aksenov

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University

Autor responsável pela correspondência
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

N. A. Valisheva

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090

D. Dmitriev

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090

I. Marchishin

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090

A. Toropov

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090

K. Zhuravlev

Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University

Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

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