The Influence of the InAlAs Layer Surface Morphology on the Temperature Dependence of Parameters of Au/Ti/n-InAlAs(001) Schottky Diodes
- Autores: Chistokhin I.B.1, Aksenov M.S.1,2, Valisheva N.1, Dmitriev D.V.1, Marchishin I.V.1, Toropov A.I.1, Zhuravlev K.S.1,2
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Afiliações:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State University
- Edição: Volume 45, Nº 2 (2019)
- Páginas: 180-184
- Seção: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208227
- DOI: https://doi.org/10.1134/S106378501902024X
- ID: 208227
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Resumo
Growth-related structural defects present on the surface of InAlAs layers grown by molecular beam epitaxy on InP(001) substrates influence the temperature dependences of the current–voltage characteristics of Au/Ti/InAlAs Schottky barriers. It is established that these defects in the form of pits cause the appearance of regions with reduced barrier height. At a surface density of ≥107 cm–2, these defects significantly influence the parameters of the Schottky barriers at temperatures below 200 K.
Sobre autores
I. Chistokhin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090
M. Aksenov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University
Autor responsável pela correspondência
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090; Novosibirsk, 630090
N. A. Valisheva
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090
D. Dmitriev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090
I. Marchishin
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090
A. Toropov
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090
K. Zhuravlev
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences; Novosibirsk State University
Email: m.se.aksenov@gmail.com
Rússia, Novosibirsk, 630090; Novosibirsk, 630090
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