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The temperature dependence of the characteristics of crystalline-silicon-based heterojunction solar cells


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Resumo

Temperature dependences of the photovoltaic characteristics of (p)a-Si/(i)a-Si:H/(n)c-Si singlecrystalline- silicon based heterojunction-with-intrinsic-thin-layer (HIT) solar cells have been measured in a temperature range of 80–420 K. The open-circuit voltage (VOC), fill factor (FF) of the current–voltage (I–U) characteristic, and maximum output power (Pmax) reach limiting values in the interval of 200–250 K on the background of monotonic growth in the short-circuit current (ISC) in a temperature range of 80–400 K. At temperatures below this interval, the VOC, FF, and Pmax values exhibit a decrease. It is theoretically justified that a decrease in the photovoltaic energy conversion characteristics of solar cells observed on heating from 250 to 400 K is related to exponential growth in the intrinsic conductivity. At temperatures below 200 K, the I–U curve shape exhibits a change that is accompanied by a drop in VOC. Possible factors that account for the decrease in VOC, FF, and Pmax are considered.

Sobre autores

A. Sachenko

Lashkaryov Institute of Semiconductor Physics

Autor responsável pela correspondência
Email: sach@isp.kiev.ua
Ucrânia, Kyiv, 03028

Yu. Kryuchenko

Lashkaryov Institute of Semiconductor Physics

Email: sach@isp.kiev.ua
Ucrânia, Kyiv, 03028

V. Kostylyov

Lashkaryov Institute of Semiconductor Physics

Email: sach@isp.kiev.ua
Ucrânia, Kyiv, 03028

R. Korkishko

Lashkaryov Institute of Semiconductor Physics

Email: sach@isp.kiev.ua
Ucrânia, Kyiv, 03028

I. Sokolovskyi

Lashkaryov Institute of Semiconductor Physics

Email: sach@isp.kiev.ua
Ucrânia, Kyiv, 03028

A. Abramov

R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194064

S. Abolmasov

R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194064

D. Andronikov

R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194064

A. Bobyl’

Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194021

I. Panaiotti

Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194021

E. Terukov

R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute; Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194064; St. Petersburg, 194021

A. Titov

Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194021

M. Shvarts

Ioffe Physical Technical Institute

Email: sach@isp.kiev.ua
Rússia, St. Petersburg, 194021

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