The temperature dependence of the characteristics of crystalline-silicon-based heterojunction solar cells
- 作者: Sachenko A.V.1, Kryuchenko Y.V.1, Kostylyov V.P.1, Korkishko R.M.1, Sokolovskyi I.O.1, Abramov A.S.2, Abolmasov S.N.2, Andronikov D.A.2, Bobyl’ A.V.3, Panaiotti I.E.3, Terukov E.I.2,3, Titov A.S.3, Shvarts M.Z.3
-
隶属关系:
- Lashkaryov Institute of Semiconductor Physics
- R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute
- Ioffe Physical Technical Institute
- 期: 卷 42, 编号 3 (2016)
- 页面: 313-316
- 栏目: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/198172
- DOI: https://doi.org/10.1134/S1063785016030305
- ID: 198172
如何引用文章
详细
Temperature dependences of the photovoltaic characteristics of (p)a-Si/(i)a-Si:H/(n)c-Si singlecrystalline- silicon based heterojunction-with-intrinsic-thin-layer (HIT) solar cells have been measured in a temperature range of 80–420 K. The open-circuit voltage (VOC), fill factor (FF) of the current–voltage (I–U) characteristic, and maximum output power (Pmax) reach limiting values in the interval of 200–250 K on the background of monotonic growth in the short-circuit current (ISC) in a temperature range of 80–400 K. At temperatures below this interval, the VOC, FF, and Pmax values exhibit a decrease. It is theoretically justified that a decrease in the photovoltaic energy conversion characteristics of solar cells observed on heating from 250 to 400 K is related to exponential growth in the intrinsic conductivity. At temperatures below 200 K, the I–U curve shape exhibits a change that is accompanied by a drop in VOC. Possible factors that account for the decrease in VOC, FF, and Pmax are considered.
作者简介
A. Sachenko
Lashkaryov Institute of Semiconductor Physics
编辑信件的主要联系方式.
Email: sach@isp.kiev.ua
乌克兰, Kyiv, 03028
Yu. Kryuchenko
Lashkaryov Institute of Semiconductor Physics
Email: sach@isp.kiev.ua
乌克兰, Kyiv, 03028
V. Kostylyov
Lashkaryov Institute of Semiconductor Physics
Email: sach@isp.kiev.ua
乌克兰, Kyiv, 03028
R. Korkishko
Lashkaryov Institute of Semiconductor Physics
Email: sach@isp.kiev.ua
乌克兰, Kyiv, 03028
I. Sokolovskyi
Lashkaryov Institute of Semiconductor Physics
Email: sach@isp.kiev.ua
乌克兰, Kyiv, 03028
A. Abramov
R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194064
S. Abolmasov
R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194064
D. Andronikov
R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194064
A. Bobyl’
Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194021
I. Panaiotti
Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194021
E. Terukov
R&D Center for Thin-Film Technologies in Energetics, Ioffe Physical Technical Institute; Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194064; St. Petersburg, 194021
A. Titov
Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194021
M. Shvarts
Ioffe Physical Technical Institute
Email: sach@isp.kiev.ua
俄罗斯联邦, St. Petersburg, 194021
补充文件
