Interaction between antimony atoms and micropores in silicon
- 作者: Odzhaev V.B.1, Petlitskii A.N.2, Plebanovich V.I.3, Sadovskii P.K.1, Tarasik M.I.1, Chelyadinskii A.R.1
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隶属关系:
- Belarusian State University
- Integral
- Planar
- 期: 卷 60, 编号 1 (2018)
- 页面: 20-22
- 栏目: Semiconductors
- URL: https://bakhtiniada.ru/1063-7834/article/view/201836
- DOI: https://doi.org/10.1134/S1063783418010158
- ID: 201836
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详细
The interaction between Sb atoms and micropores of a getter layer in silicon is studied. The getter layer was obtained via implantation of Sb+ ions into silicon and subsequent heat treatment processes. The antimony atoms located in the vicinity of micropores are captured by micropores during gettering annealing and lose its electrical activity. The activation energy of capture process to the pores for antimony is lower than that of antimony diffusion in silicon deformation fields around microvoids on the diffusion process.
作者简介
V. Odzhaev
Belarusian State University
Email: chelyadinski@bsu.by
白俄罗斯, Minsk, 220030
A. Petlitskii
Integral
Email: chelyadinski@bsu.by
白俄罗斯, Minsk
V. Plebanovich
Planar
Email: chelyadinski@bsu.by
白俄罗斯, Minsk
P. Sadovskii
Belarusian State University
Email: chelyadinski@bsu.by
白俄罗斯, Minsk, 220030
M. Tarasik
Belarusian State University
Email: chelyadinski@bsu.by
白俄罗斯, Minsk, 220030
A. Chelyadinskii
Belarusian State University
编辑信件的主要联系方式.
Email: chelyadinski@bsu.by
白俄罗斯, Minsk, 220030
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