Interaction between antimony atoms and micropores in silicon
- Авторлар: Odzhaev V.B.1, Petlitskii A.N.2, Plebanovich V.I.3, Sadovskii P.K.1, Tarasik M.I.1, Chelyadinskii A.R.1
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Мекемелер:
- Belarusian State University
- Integral
- Planar
- Шығарылым: Том 60, № 1 (2018)
- Беттер: 20-22
- Бөлім: Semiconductors
- URL: https://bakhtiniada.ru/1063-7834/article/view/201836
- DOI: https://doi.org/10.1134/S1063783418010158
- ID: 201836
Дәйексөз келтіру
Аннотация
The interaction between Sb atoms and micropores of a getter layer in silicon is studied. The getter layer was obtained via implantation of Sb+ ions into silicon and subsequent heat treatment processes. The antimony atoms located in the vicinity of micropores are captured by micropores during gettering annealing and lose its electrical activity. The activation energy of capture process to the pores for antimony is lower than that of antimony diffusion in silicon deformation fields around microvoids on the diffusion process.
Авторлар туралы
V. Odzhaev
Belarusian State University
Email: chelyadinski@bsu.by
Белоруссия, Minsk, 220030
A. Petlitskii
Integral
Email: chelyadinski@bsu.by
Белоруссия, Minsk
V. Plebanovich
Planar
Email: chelyadinski@bsu.by
Белоруссия, Minsk
P. Sadovskii
Belarusian State University
Email: chelyadinski@bsu.by
Белоруссия, Minsk, 220030
M. Tarasik
Belarusian State University
Email: chelyadinski@bsu.by
Белоруссия, Minsk, 220030
A. Chelyadinskii
Belarusian State University
Хат алмасуға жауапты Автор.
Email: chelyadinski@bsu.by
Белоруссия, Minsk, 220030
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