Investigation of High-Intensity Ion Beam Generation in the Diode with External Magnetic Insulation and Explosive Plasma Emission Source

V. I. Shamanin; A. V. Stepanov; K. Zh. Rysbaev

doi:10.1007/s11182-018-1333-6

Investigation of High-Intensity Ion Beam Generation in the Diode with External Magnetic Insulation and Explosive Plasma Emission Source

作者: Shamanin V.I.¹, Stepanov A.V.¹, Rysbaev K.Z.¹
隶属关系:
1. National Research Tomsk Polytechnic University
期: 卷 60, 编号 12 (2018)
页面: 2111-2114
栏目: Article
URL: https://bakhtiniada.ru/1064-8887/article/view/239827
DOI: https://doi.org/10.1007/s11182-018-1333-6
ID: 239827

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详细

The ion B_r-diode in which plasma is generated under the action of a negative pre-pulse voltage is presented. Preliminary plasma formation allows the energy released in the diode during a positive voltage pulse to be increased. The high-energy ion beam parameters are investigated for the magnetic field induction changing from 0.8В_cr to 1.7B_cr.