Investigation of High-Intensity Ion Beam Generation in the Diode with External Magnetic Insulation and Explosive Plasma Emission Source
- Авторы: Shamanin V.I.1, Stepanov A.V.1, Rysbaev K.Z.1
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Учреждения:
- National Research Tomsk Polytechnic University
- Выпуск: Том 60, № 12 (2018)
- Страницы: 2111-2114
- Раздел: Article
- URL: https://bakhtiniada.ru/1064-8887/article/view/239827
- DOI: https://doi.org/10.1007/s11182-018-1333-6
- ID: 239827
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Аннотация
The ion Br-diode in which plasma is generated under the action of a negative pre-pulse voltage is presented. Preliminary plasma formation allows the energy released in the diode during a positive voltage pulse to be increased. The high-energy ion beam parameters are investigated for the magnetic field induction changing from 0.8Вcr to 1.7Bcr.
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Об авторах
V. Shamanin
National Research Tomsk Polytechnic University
Автор, ответственный за переписку.
Email: shamanin@tpu.ru
Россия, Tomsk
A. Stepanov
National Research Tomsk Polytechnic University
Email: shamanin@tpu.ru
Россия, Tomsk
K. Rysbaev
National Research Tomsk Polytechnic University
Email: shamanin@tpu.ru
Россия, Tomsk
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