Studying the Effect of Doping with Nickel on Silicon-Based Solar Cells with a Deep p–n-Junction
- Autores: Bakhadyrkhanov M.K.1, Isamov S.B.1, Kenzhaev Z.T.2, Koveshnikov S.V.1
-
Afiliações:
- Tashkent State Technical University
- Karakalpak State University
- Edição: Volume 45, Nº 10 (2019)
- Páginas: 959-962
- Seção: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208438
- DOI: https://doi.org/10.1134/S1063785019100031
- ID: 208438
Citar
Resumo
It has been shown that the doping of the front side of a solar cell with a deep-level p–n junction with nickel atoms increases short-circuit current density Jsc by 89% and open-circuit voltage Voc by 19.7%. Additional thermal treatment at 700°C for 1 h increases Jsc by 98.4% and Voc by 13.18%. It is presumed that the IR radiation conversion efficiency grows because nickel atoms form clusters, these being getter centers for uncontrolled recombinant impurities.
Palavras-chave
Sobre autores
M. Bakhadyrkhanov
Tashkent State Technical University
Autor responsável pela correspondência
Email: bahazeb@yandex.com
Uzbequistão, Tashkent, 100095
S. Isamov
Tashkent State Technical University
Email: bahazeb@yandex.com
Uzbequistão, Tashkent, 100095
Z. Kenzhaev
Karakalpak State University
Email: bahazeb@yandex.com
Uzbequistão, Nukus, 230112
S. Koveshnikov
Tashkent State Technical University
Email: bahazeb@yandex.com
Uzbequistão, Tashkent, 100095
Arquivos suplementares
