Studying the Effect of Doping with Nickel on Silicon-Based Solar Cells with a Deep p–n-Junction
- Авторлар: Bakhadyrkhanov M.K.1, Isamov S.B.1, Kenzhaev Z.T.2, Koveshnikov S.V.1
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Мекемелер:
- Tashkent State Technical University
- Karakalpak State University
- Шығарылым: Том 45, № 10 (2019)
- Беттер: 959-962
- Бөлім: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208438
- DOI: https://doi.org/10.1134/S1063785019100031
- ID: 208438
Дәйексөз келтіру
Аннотация
It has been shown that the doping of the front side of a solar cell with a deep-level p–n junction with nickel atoms increases short-circuit current density Jsc by 89% and open-circuit voltage Voc by 19.7%. Additional thermal treatment at 700°C for 1 h increases Jsc by 98.4% and Voc by 13.18%. It is presumed that the IR radiation conversion efficiency grows because nickel atoms form clusters, these being getter centers for uncontrolled recombinant impurities.
Негізгі сөздер
Авторлар туралы
M. Bakhadyrkhanov
Tashkent State Technical University
Хат алмасуға жауапты Автор.
Email: bahazeb@yandex.com
Өзбекстан, Tashkent, 100095
S. Isamov
Tashkent State Technical University
Email: bahazeb@yandex.com
Өзбекстан, Tashkent, 100095
Z. Kenzhaev
Karakalpak State University
Email: bahazeb@yandex.com
Өзбекстан, Nukus, 230112
S. Koveshnikov
Tashkent State Technical University
Email: bahazeb@yandex.com
Өзбекстан, Tashkent, 100095
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