Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond

S. A. Bogdanov; A. M. Gorbachev; D. B. Radishev; A. L. Vikharev; M. A. Lobaev

doi:10.1134/S1063785019020032

Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond

作者: Bogdanov S.A.¹, Gorbachev A.M.¹, Radishev D.B.¹, Vikharev A.L.¹, Lobaev M.A.¹
隶属关系:
1. Federal Research Center Institute of Applied Physics of the Russian Academy of Sciences
期: 卷 45, 编号 2 (2019)
页面: 89-92
栏目: Article
URL: https://bakhtiniada.ru/1063-7850/article/view/208201
DOI: https://doi.org/10.1134/S1063785019020032
ID: 208201

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It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.