Dependence of Properties of Variable Gradient Porous Structures of Silicon on the Method of Formation
- 作者: Rubtsova K.I.1, Silina M.D.1
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隶属关系:
- National University of Science and Technology MISiS
- 期: 卷 61, 编号 12 (2019)
- 页面: 2302-2305
- 栏目: Semiconductors
- URL: https://bakhtiniada.ru/1063-7834/article/view/206773
- DOI: https://doi.org/10.1134/S1063783419120461
- ID: 206773
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详细
A series of samples of gradient-porous silicon structures with crystallographic orientations (100) and (111) by deep anode etching was obtained. Dependences of the rate of deep anodic etching and the depth of the porous layer of the samples on the anode current density are shown. The absorption and reflection coefficients of the samples were investigated by optical spectrometry, depending on their crystallographic orientation and the depth of the porous layer. The influence of water solutions on the optical properties of the samples was determined.
作者简介
K. Rubtsova
National University of Science and Technology MISiS
编辑信件的主要联系方式.
Email: rubcova.karina@gmail.com
俄罗斯联邦, Moscow, 119049
M. Silina
National University of Science and Technology MISiS
编辑信件的主要联系方式.
Email: theinnercrow@yandex.ru
俄罗斯联邦, Moscow, 119049
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