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Tight-binding simulation of silicon and germanium nanocrystals


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Abstract

This review is devoted to the modeling of Si and Ge nanocrystals by means of the tight-binding method. First we give the short outline of the modeling methods and their application for the discription of silicon and germanium nanocrystals. Then, the tight-binding method with extended s, p, d, and s* basis is explained in details and the results obtained with the use of this method are presented.

About the authors

A. V. Gert

Ioffe Institute

Author for correspondence.
Email: anton.gert@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

M. O. Nestoklon

Ioffe Institute

Email: anton.gert@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

A. A. Prokofiev

Ioffe Institute

Email: anton.gert@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

I. N. Yassievich

Ioffe Institute

Email: anton.gert@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

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