Analysis of the Chemical Composition and Structure of Micrometer-Thick Complex Oxide Films: A Case Study of a MgAl2O4 Film on SiO2 Using Electron Probe Microanalysis and Confocal Raman Spectroscopy

V. A. Bulatov; Булатов В. А.; Yu. V. Shchapova; Щапова Ю. В.; D. A. Zamyatin; Замятин Д. А.; L. Ya. Sushanek; Сушанек Л. Я.; A. S. Kamenetskikh; Каменецких А. С.; S. L. Votyakov; Вотяков С. Л.

doi:10.31857/S0044450223120034

Analysis of the Chemical Composition and Structure of Micrometer-Thick Complex Oxide Films: A Case Study of a MgAl2O4 Film on SiO2 Using Electron Probe Microanalysis and Confocal Raman Spectroscopy

Authors: Bulatov V.A.¹, Shchapova Y.V.¹, Zamyatin D.A.¹, Sushanek L.Y.¹, Kamenetskikh A.S.², Votyakov S.L.¹
Affiliations:
1. Zavaritsky Institute of Geology and Geochemistry, Ural Branch, Russian Academy of Sciences, 620110, Yekaterinburg, Russia
2. Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, 620110, Yekaterinburg, Russia
Issue: Vol 78, No 12 (2023)
Pages: 1106-1118
Section: ORIGINAL ARTICLES
Submitted: 26.12.2023
URL: https://bakhtiniada.ru/0044-4502/article/view/232890
DOI: https://doi.org/10.31857/S0044450223120034
EDN: https://elibrary.ru/EJCKSA
ID: 232890

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Abstract

Methodological approaches to both qualitative structural analysis and quantitative compositional analysis of transparent complex oxide films on dielectric substrates, performed using a Horiba LabRAM HR800 confocal Raman spectrometer and a Cameca SX100 electron probe microanalyzer, are described. The studies were carried out using magnesium–aluminum spinel films of a thickness of 1–3 µm on a quartz glass substrate, obtained by magnetron sputtering. The characterization of the film structure consisted of recording 3D arrays of its Raman spectra based on z depth profiling. The film has a disordered spinel structure with a partially reversed distribution of Mg and Al cations over octa- and tetra-positions. Operation parameters are identified to evaluate the concentration of structure-forming elements (Mg and Al) and impurities (Ti, Cr, Ca, P, Fe, Ni, and Gd) in the film using various X-ray emission lines (optimal accelerating voltage, etc.). The performance of the procedure was determined, and its capabilities and limitations were assessed. The resulting data on the chemical composition of the film are presented.

Keywords

electron probe microanalysis, Raman spectroscopy, thin films, MgAl2O4

References

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