Electrochemical Deposition by Design of Metal Nanostructures


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We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.

作者简介

Ed. Monaico

National Center for Materials Study and Testing, Technical University of Moldova

编辑信件的主要联系方式.
Email: eduard.monaico@cnstm.utm.md
摩尔多瓦共和国, Chisinau, MD-2004

E. Monaico

National Center for Materials Study and Testing, Technical University of Moldova

Email: tiginyanu@gmail.com
摩尔多瓦共和国, Chisinau, MD-2004

V. Ursaki

Institute of Electronic Engineering and Nanotechnologies

Email: tiginyanu@gmail.com
摩尔多瓦共和国, Chisinau, MD-2028

I. Tiginyanu

National Center for Materials Study and Testing, Technical University of Moldova

编辑信件的主要联系方式.
Email: tiginyanu@gmail.com
摩尔多瓦共和国, Chisinau, MD-2004

K. Nielsch

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden); Institute of Materials Science, Technische Universität Dresden; Institute of Applied Physics, Technische Universität Dresden

Email: tiginyanu@gmail.com
德国, Dresden, 01069; Dresden, 01062; Dresden, 01062

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