Electrochemical Deposition by Design of Metal Nanostructures


Citar

Texto integral

Acesso aberto Acesso aberto
Acesso é fechado Acesso está concedido
Acesso é fechado Somente assinantes

Resumo

We report on the application of specially-designed masks for the purpose of electrochemical etching of InP single crystals which enables one to change in a controlled fashion the direction of propagation of pores, including those propagating in directions parallel to the top surface of substrates. The fabricated templates have been used to electrochemically deposit metallic nanostructures along predefined directions and to develop two-dimensional arrays of metallic nanotubes or nanowires embedded in semiconductor matrices.

Sobre autores

Ed. Monaico

National Center for Materials Study and Testing, Technical University of Moldova

Autor responsável pela correspondência
Email: eduard.monaico@cnstm.utm.md
Moldova, Chisinau, MD-2004

E. Monaico

National Center for Materials Study and Testing, Technical University of Moldova

Email: tiginyanu@gmail.com
Moldova, Chisinau, MD-2004

V. Ursaki

Institute of Electronic Engineering and Nanotechnologies

Email: tiginyanu@gmail.com
Moldova, Chisinau, MD-2028

I. Tiginyanu

National Center for Materials Study and Testing, Technical University of Moldova

Autor responsável pela correspondência
Email: tiginyanu@gmail.com
Moldova, Chisinau, MD-2004

K. Nielsch

Leibniz Institute for Solid State and Materials Research Dresden (IFW Dresden); Institute of Materials Science, Technische Universität Dresden; Institute of Applied Physics, Technische Universität Dresden

Email: tiginyanu@gmail.com
Alemanha, Dresden, 01069; Dresden, 01062; Dresden, 01062

Arquivos suplementares

Arquivos suplementares
Ação
1. JATS XML

Declaração de direitos autorais © Allerton Press, Inc., 2019