Influence of the Non-Uniformity of Surface Dielectric Film Thickness on Cathode Sputtering in a Glow Discharge

Abstract

Special features of sputtering of the cathode with a thin dielectric film of variable thickness in a glow discharge are studied. It is shown that the flux density of atoms sputtered from the cathode is maximal on its sections with minimal film thickness due to focusing of ion flux caused by the violation of the electric field uniformity near the cathode surface. As a result, the non-uniformity of the film thickness increases with time, thereby leading to the formation of pores in the film.