Application of a Tangential Magnetic Field and Negative Repetitively Pulsed Bias for Suppression of Vacuum-Arc Copper Macroparticles
- Autores: Ryabchikov A.I.1, Anan’in P.S.1, Shevelev A.E.1
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Afiliações:
- National Reseach Tomsk Polytechnic University
- Edição: Volume 59, Nº 6 (2016)
- Páginas: 900-906
- Seção: Plasma Physics
- URL: https://bakhtiniada.ru/1064-8887/article/view/237342
- DOI: https://doi.org/10.1007/s11182-016-0851-3
- ID: 237342
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Resumo
The joint effect of magnetic fields normal and tangential to the cathode surface and of short-pulse highfrequency bias potential of negative polarity on the accumulation of macroparticles on the potential target immersed in copper vacuum-arc plasma is studied. It is shown that the application of a vacuum-arc evaporator with the magnetic field tangential to the cathode surface reduces by 5 times generation of copper macroparticles in comparison with an axially symmetric vacuum-arc evaporator in which the magnetic field normal to the working cathode surface is used. It is established that the joint action of the tangential field and short-pulse high-frequency bias potential makes it possible to decrease by 2–3 orders of magnitude the density of copper macroparticles on the target surface.
Sobre autores
A. Ryabchikov
National Reseach Tomsk Polytechnic University
Autor responsável pela correspondência
Email: RALEX@tpu.ru
Rússia, Tomsk
P. Anan’in
National Reseach Tomsk Polytechnic University
Email: RALEX@tpu.ru
Rússia, Tomsk
A. Shevelev
National Reseach Tomsk Polytechnic University
Email: RALEX@tpu.ru
Rússia, Tomsk
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