Formation of ordered nano- and mesostructures in silicon irradiated with a single femtosecond laser pulse in different environments


如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

We report on a new class of ordered nano- and mesostructures, including distinct structured areas with subnanoscale roughness, produced by interaction of single tightly focused femtosecond laser pulses with a monocrystalline silicon surface under different environments. The environment was found to have a significant effect on the final morphology of near-surface layers of silicon.

作者简介

S. Romashevskiy

Joint Institute for High Temperatures; National Research University “Moscow Power Engineering Institute,”

编辑信件的主要联系方式.
Email: sa.romashevskiy@gmail.com
俄罗斯联邦, Moscow, 125412; Moscow, 111250

S. Ashitkov

Joint Institute for High Temperatures

Email: sa.romashevskiy@gmail.com
俄罗斯联邦, Moscow, 125412

A. Dmitriev

National Research University “Moscow Power Engineering Institute,”

Email: sa.romashevskiy@gmail.com
俄罗斯联邦, Moscow, 111250

补充文件

附件文件
动作
1. JATS XML

版权所有 © Pleiades Publishing, Ltd., 2016