Thermal lithography of thin films of vanadium dioxide

V. N. Andreev; V. A. Klimov; M. E. Kompan

doi:10.1134/S1063785016010028

Thermal lithography of thin films of vanadium dioxide

作者: Andreev V.N.¹, Klimov V.A.¹, Kompan M.E.¹
隶属关系:
1. Ioffe Physical Technical Institute
期: 卷 42, 编号 1 (2016)
页面: 19-22
栏目: Article
URL: https://bakhtiniada.ru/1063-7850/article/view/196701
DOI: https://doi.org/10.1134/S1063785016010028
ID: 196701

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详细

A technique is proposed for making microareas with sharply different optical and electrical properties in thin films of vanadium dioxide. The technique is based on vacuum annealing of thin films, which results in a yield of oxygen from vanadium dioxide with the formation of an oxygen vacancy in it.