Insulating GaN Epilayers Co-Doped with Iron and Carbon
- Авторы: Lundin W.V.1, Sakharov A.V.1, Zavarin E.E.1, Zakgeim D.A.1, Lundina E.Y.1, Brunkov P.N.1, Tsatsulnikov A.F.2
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Учреждения:
- Ioffe Physical Technical Institute, Russian Academy of Sciences
- Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
- Выпуск: Том 45, № 7 (2019)
- Страницы: 723-726
- Раздел: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208377
- DOI: https://doi.org/10.1134/S106378501907023X
- ID: 208377
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Аннотация
The morphology and electrical properties of doped semi-insulating gallium nitride (GaN) epilayers have been studied. It was found that doping-induced improvement of the insulating properties of GaN epilayers with increased level of doping with carbon or iron is limited by the accompanying deterioration of surface morphology. The character of impurity-related morphology development is different for the two dopants. It is established that the co-doping with carbon and iron allows planarity of the GaN surface to be retained along with a significant improvement of insulating properties of epilayers.
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Об авторах
W. Lundin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Автор, ответственный за переписку.
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
D. Zakgeim
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
E. Lundina
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
P. Brunkov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
A. Tsatsulnikov
Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Россия, St. Petersburg, 194021
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