Insulating GaN Epilayers Co-Doped with Iron and Carbon
- Авторлар: Lundin W.V.1, Sakharov A.V.1, Zavarin E.E.1, Zakgeim D.A.1, Lundina E.Y.1, Brunkov P.N.1, Tsatsulnikov A.F.2
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Мекемелер:
- Ioffe Physical Technical Institute, Russian Academy of Sciences
- Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
- Шығарылым: Том 45, № 7 (2019)
- Беттер: 723-726
- Бөлім: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208377
- DOI: https://doi.org/10.1134/S106378501907023X
- ID: 208377
Дәйексөз келтіру
Аннотация
The morphology and electrical properties of doped semi-insulating gallium nitride (GaN) epilayers have been studied. It was found that doping-induced improvement of the insulating properties of GaN epilayers with increased level of doping with carbon or iron is limited by the accompanying deterioration of surface morphology. The character of impurity-related morphology development is different for the two dopants. It is established that the co-doping with carbon and iron allows planarity of the GaN surface to be retained along with a significant improvement of insulating properties of epilayers.
Негізгі сөздер
Авторлар туралы
W. Lundin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
D. Zakgeim
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
E. Lundina
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
P. Brunkov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
A. Tsatsulnikov
Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Ресей, St. Petersburg, 194021
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