Отправить статью по E-mail Adhesion at the Ta(Mo)/NiTi Interface
- Авторы: Bakulin A.V.1,2, Kulkova S.E.1,2
-
Учреждения:
- Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences
- National Research Tomsk State University
- Выпуск: Том 45, № 6 (2019)
- Страницы: 620-624
- Раздел: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208348
- DOI: https://doi.org/10.1134/S1063785019060208
- ID: 208348
Цитировать
Открытый доступ
Доступ предоставлен
Только для подписчиков
Аннотация
The atomic and electronic structures of Me(110)/NiTi(110) and TiO2(100)/Me(110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the metal–oxide interface can lead to decreased adhesion at the interface.
Об авторах
A. Bakulin
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Автор, ответственный за переписку.
Email: bakulin@ispms.tsc.ru
Россия, Tomsk, 634055; Tomsk, 634050
S. Kulkova
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Email: bakulin@ispms.tsc.ru
Россия, Tomsk, 634055; Tomsk, 634050
Дополнительные файлы
