Мақаланы E-mail арқылы жіберу Adhesion at the Ta(Mo)/NiTi Interface
- Авторлар: Bakulin A.V.1,2, Kulkova S.E.1,2
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Мекемелер:
- Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences
- National Research Tomsk State University
- Шығарылым: Том 45, № 6 (2019)
- Беттер: 620-624
- Бөлім: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/208348
- DOI: https://doi.org/10.1134/S1063785019060208
- ID: 208348
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Аннотация
The atomic and electronic structures of Me(110)/NiTi(110) and TiO2(100)/Me(110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the metal–oxide interface can lead to decreased adhesion at the interface.
Авторлар туралы
A. Bakulin
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Хат алмасуға жауапты Автор.
Email: bakulin@ispms.tsc.ru
Ресей, Tomsk, 634055; Tomsk, 634050
S. Kulkova
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Email: bakulin@ispms.tsc.ru
Ресей, Tomsk, 634055; Tomsk, 634050
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