The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules
- Authors: Stetsyura S.V.1, Kozlowski A.V.1
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Affiliations:
- Saratov State University
- Issue: Vol 43, No 3 (2017)
- Pages: 285-288
- Section: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/203904
- DOI: https://doi.org/10.1134/S1063785017030233
- ID: 203904
Cite item
Abstract
White-light illumination during the adsorption of polyanionic molecules of glucose oxidase (GOx) enzyme on the surface of p-Si/SiO2/polyethylenimine structure leads to a threefold decrease in the surface concentration of GOx molecules. Same illumination during the GOx adsorption on the n-Si/SiO2/PEI structure leads to a sevenfold increase in the surface concentration of enzyme molecules. Changes in the amount of adsorbed GOx molecules depending on the intensity of irradiation are explained by electron transfer processes and recharging of electronic states at the Si/SiO2 interface and within SiO2 layer.
About the authors
S. V. Stetsyura
Saratov State University
Author for correspondence.
Email: stetsyurasv@mail.ru
Russian Federation, Saratov, 410012
A. V. Kozlowski
Saratov State University
Email: stetsyurasv@mail.ru
Russian Federation, Saratov, 410012
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