Influence of the working gas pressure on the magnetic properties and texture of magnetron-sputtered Fe/SiO2/Si(100) polycrystalline films
- Авторы: Nikulin Y.V.1, Dzhumaliev A.S.1, Filimonov Y.A.1
-
Учреждения:
- Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch
- Выпуск: Том 61, № 5 (2016)
- Страницы: 779-782
- Раздел: Physical Electronics
- URL: https://bakhtiniada.ru/1063-7842/article/view/197240
- DOI: https://doi.org/10.1134/S1063784216050182
- ID: 197240
Цитировать
Аннотация
The magnetic properties and texture of 90-nm-thick polycrystalline Fe/SiO2/Si(100) films magnetron-sputtered under different working gas pressures are investigated. It is shown that when the pressure declines, the magnetization of the films may grow by 50%, whereas the ferromagnetic resonance linewidth and the coercive force may decrease by more than an order of magnitude. Such variations of the magnetic properties correlate with a Fe(110) to Fe(200) change in the film texture and with the columnar to quasi-uniform microstructure transition.
Об авторах
Yu. Nikulin
Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch
Автор, ответственный за переписку.
Email: yvnikulin@gmail.com
Россия, Zelenaya ul. 38, Saratov, 410019
A. Dzhumaliev
Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch
Email: yvnikulin@gmail.com
Россия, Zelenaya ul. 38, Saratov, 410019
Yu. Filimonov
Kotel’nikov Institute of Radio Engineering and Electronics, Saratov Branch
Email: yvnikulin@gmail.com
Россия, Zelenaya ul. 38, Saratov, 410019
Дополнительные файлы
