Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films

Аннотация

The results of studying the effect of low-energy argon ion bombardment (~30 eV) on residual mechanical stresses in a thin chromium film are presented. The change in the mean value and stress gradient as a function of the ion bombardment duration was determined by the change in the bend of test micromechanical bridges and cantilevers. A method is proposed for calculating the depth of the stress modification in a film using these structures. It has been established that the long-term ion-plasma treatment at room temperature affects stresses at a depth of more than 100 nm.