Kinetic constants of abnormal grain growth in nanocrystalline nickel
- 作者: Aleshin A.N.1
-
隶属关系:
- Institute of Ultra High Frequency (UHF) Semiconductor Electronics
- 期: 卷 58, 编号 2 (2016)
- 页面: 413-420
- 栏目: Thermal Properties
- URL: https://bakhtiniada.ru/1063-7834/article/view/197029
- DOI: https://doi.org/10.1134/S1063783416020049
- ID: 197029
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详细
The grain growth in nanocrystalline nickel with a purity of 99.5 at % during non-isothermal annealing was experimentally investigated using differential scanning calorimetry and transmission electron microscopy. Nanocrystalline nickel was prepared by electrodeposition and had an average grain size of approximately 20 nm. It was shown that, at a temperature corresponding to the calorimetric signal peak, abnormal grain growth occurs with the formation of a bimodal grain microstructure. Calorimeters signals were processed within the Johnson–Mehl–Avrami formalism. This made it possible to determine the exponent of the corresponding equation, the frequency factor, and the activation energy of the grain growth, which was found to be equal to the activation energy of the vacancy migration. The reasons for the abnormal grain growth in nanocrystalline nickel were discussed.
作者简介
A. Aleshin
Institute of Ultra High Frequency (UHF) Semiconductor Electronics
编辑信件的主要联系方式.
Email: a.n.aleshin@mail.ru
俄罗斯联邦, Nagornyi proezd 7–5, Moscow, 117105
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