作者的详细信息

Mizerov, M.N.

期 栏目 标题 文件
卷 52, 编号 16 (2018) 26th INTERNATIONAL SYMPOSIUM “NANOSTRUCTURES: PHYSICS AND TECHNOLOGY”. NANOSTRUCTURE TECHNOLOGY FIB Lithography Challenges of Si3N4/GaN Mask Preparation for Selective Epitaxy