Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes

D. M. Mitin; S. A. Raudik; A. M. Mozharov; A. D. Bolshakov; V. V. Fedorov; V. V. Nepokh; P. M. Rajanna; A. G. Nasibulin; I. S. Mukhin

doi:10.1134/S1063782619140148

Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes

作者: Mitin D.M.¹^,2, Raudik S.A.¹, Mozharov A.M.³, Bolshakov A.D.¹, Fedorov V.V.¹, Nepokh V.V.¹, Rajanna P.M.⁴, Nasibulin A.G.⁴, Mukhin I.S.¹^,3
隶属关系:
1. Saint Petersburg Academic University
2. Ioffe Institute
3. ITMO University
4. Skolkovo Institute of Science and Technology
期: 卷 53, 编号 14 (2019)
页面: 1926-1928
栏目: Nanostructures Characterization
URL: https://bakhtiniada.ru/1063-7826/article/view/207523
DOI: https://doi.org/10.1134/S1063782619140148
ID: 207523

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Transparency and sheet resistance measurements of transferred CNT film on glass substrate were performed. Effect of optical lithography and plasma treatment processes on CNT film sheet resistance was analyzed. CNT film demonstrates good electrical conductivity and chemical stability to post-growth processing techniques. The maximum increase in the sheet resistance of the CNT film after optical lithography and plasma treatment processes is no more than 7%.