Polymethyl Methacrylate with a Molecular Weight of 10 7  g/mol for X-Ray Lithography

V. P. Nazmov; Назьмов В. П.; A. V. Varand; Варанд А. В.; M. A. Mikhailenko; Михайленко М. А.; B. G. Goldenberg; Гольденберг Б. Г.; I. Yu. Prosanov; Просанов И. Ю.; K. B. Gerasimov; Герасимов К. Б.

doi:10.31857/S1028096023060110

Polymethyl Methacrylate with a Molecular Weight of 10⁷ g/mol for X-Ray Lithography

作者: Nazmov V.P.¹^,2, Varand A.V.¹, Mikhailenko M.A.², Goldenberg B.G.¹^,3, Prosanov I.Y.², Gerasimov K.B.²
隶属关系:
1. Budker Institute of Nuclear Physics of SB RAS
2. Institute of Solid State Chemistry and Mechanochemistry of SB RAS
3. Shared-Use Center “SKIF”, Boreskov Institute of Catalysis of SB RAS
期: 编号 6 (2023)
页面: 27-31
栏目: Articles
URL: https://bakhtiniada.ru/1028-0960/article/view/137764
DOI: https://doi.org/10.31857/S1028096023060110
EDN: https://elibrary.ru/DKCOQS
ID: 137764

如何引用文章

全文:

开放存取

##reader.subscriptionAccessGranted##
受限制的访问

订阅存取

详细
作者简介
参考
补充文件
统计

详细

The results of a study of syndiotactic polymethyl methacrylate with a molecular weight of 10⁷ g/mol, synthesized via ionic polymerization with radiation initiation, are presented. Changes in the chemical structure of the polymer material have been analyzed by IR spectroscopy, differential thermal analysis, and gel permeation chromatography. During thermal decomposition of the initial polymer, the mass loss process can be divided into three stages: low-temperature, medium-temperature, and high-temperature. The pronounced thermal effect of polymer melting disappears even after exposure to minimal doses of ionizing radiation. A relatively rapid decrease in the molecular weight under the influence of X-ray radiation in the dose range up to 100 J/cm³ and a scatter in molecular sizes have been found. Polydispersity at low doses is approximately 3.5 times higher than that at doses of the order of 10 kJ/cm³. A latent image development rate of approximately five times higher than that of a polymer with a molecular weight of 10⁶ g/mol under standard conditions was achieved. The contrast value was 3.4. Using X-ray synchrotron radiation at the VEPP-3 source, microstructuring was carried out by X-ray lithography. Microstructures up to 5 µm high and about 2 µm in diameter were obtained.

关键词

polymethyl methacrylate, IR spectroscopy, gel permeation chromatography, differential thermal analysis, contrast, X-ray radiation, sensitivity, microstructures, X-ray lithography.

参考

Haller I., Hatzakis M., Srinivasan R. // IBM J. Res. Devel. 1968. V. 12. P. 251. https://doi.org/10.1147/rd.123.0251
Spears D.L., Smith H.I. // Electron. Lett. 1972. V. 8. P. 102. https://doi.org/10.1049/el:19720074
Vladimirsky Y., Vladimirsky O., Morris K.J., M. Klopf J., Calderon G.M., Saile V. // Microelectron. Eng. 1996. V. 30. № 1–4. P. 543. https://doi.org/10.1016/0167-9317(95)00305-3
Greeneich J.S. // J. Electrochem. Soc. 1975. V. 122. P. 970.
Charlesby A. Atomic Radiation and Polymers. N.Y.: Pergamon, 1960. 556 p.
Hiraoka H. // IBM J. Res. Devel. 1977. V. 21. P. 121. https://doi.org/10.1147/rd.212.0121
De Carlo F., Mancini D.C., Lai B., Song J.J. // Microsyst. Technol. 1998. V. 4. P. 86. https://doi.org/10.1007/s005420050102
Nazmov V.P., Mezentseva L.A., Pindyurin V.F., Petrov V.V., Yakovleva E.N. // Nucl. Instrum. Methods Phys. Res. A. 2000. V. 448. P. 493. https://doi.org/10.1016/S0168-9002(00)00238-2
Pantenburg F.J., Achenbach S., Mohr J. // J. Vac. Sci. Technol. B. 1998. V. 16. № 6. P. 3547. https://doi.org/10.1116/1.590494
Moreau W.M. Semiconductor Lithography: Principles, Practices, and Materials. N.Y.: Plenum Press, 1988. 986 p.
Yan M., Choi S., Subramanian K.R.V., Adesida I. // J. Vac. Sci. Technol. B. 2008. V. 26. № 6. P. 2306. https://doi.org/1.0.1116/1.3002562
Khoury M., Ferry D.K. // J. Vac. Sci. Technol. B. 1996. V. 14. № 1. P. 75. https://doi.org/10.1116/1.588437
Nagai H. // J. Appl. Pol. Sci. 1963. V. 7. № 5. P. 1697 https://doi.org/10.1002/app.1963.070070512
Willis H.A., Zichy V.J.I., Hendra P.J. // Polymer. 1969. V. 10. P.737. https://doi.org/10.1016/0032-3861(69)90101-3
Patent No. 3039110 (DE). Verfahren fur Die Spannungsfreie Entwicklung von Bestrahlten Polymethylmethacrylatschichten / Siemens AG, Munich. Glasha- user W., Ghica G.-V. 16.10.1980.
Goldenberg B.G., Lemzyakov A.G., Nazmov V.P., Pindyurin V.F. // Phys. Procedia. 2016. V. 84. P. 205. https://doi.org/10.1016/j.phpro.2016.11.036
Piminov P.A., Baranov G.N., Bogomyagkov A.V., Berkaev D.E., Borin V.M., Dorokhov V.L., Karnaev S.E., Kiselev V.A., Levichev E.B., Meshkov O.I., Mishnev S.I., Nikitin S.A., Nikolaev I.B., Sinyatkin S.V., Vobly P.D., Zolotarev K.V., Zhuravlev A.N. // Phys. Procedia. 2016. V. 84. P. 19. https://doi.org/10.1016/j.phpro.2016.11.005
Nazmov V., Goldenberg B., Vasiliev A., Asadchikov V. // J. Micromech. Microeng. 2021. V. 31. P. 055011. https://doi.org/10.1088/1361-6439/abf331
El-Kholi A., Mohr J., Nazmov V. // Nucl. Instrum. Methods Phys. Res. A. 2000. V. 448. № 1–2. P. 497. https://doi.org/10.1016/S0168-9002(00)00239-4
Kunka D., Mohr J., Nazmov V., Meiser J., Meyer P., Amberger M., Koch F., Schulz J., Walter M., Duttenhofer T., Voigt A., Ahrens G., Grützner G. // Microsyst. Technol. 2014. V. 20. № 10–11. P. 2023. https://doi.org/10.1007/s00542-013-2055-x
McNamara S. // J. Micromech. Microeng. 2011. V. 21. P. 015002. https://doi.org/10.1088/0960-1317/21/1/015002