Email this article Near-fild optical lithography in application to plasmonic antennas characterization
- Authors: Shelaev A.V.1, Dorozhkin P.S.1,2, Bykov V.A.1
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Affiliations:
- NT-MDT Co., build. 317-A
- Skolkovo Institute of Science and Technology
- Issue: Vol 59, No 6 (2016)
- Pages: 837-841
- Section: Laboratory Techniques
- URL: https://bakhtiniada.ru/0020-4412/article/view/159396
- DOI: https://doi.org/10.1134/S0020441216050134
- ID: 159396
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Abstract
Proposed a method of measurements for both electrical field enhancement and size of near-field localization area for plasmonic antenna-probe. The method is based on optical modification of photosensitive sample. Shown the results of the proposed method and subdiffraction resolution of test image is demonstrated.
About the authors
A. V. Shelaev
NT-MDT Co., build. 317-A
Author for correspondence.
Email: shelaev@ntmdt.ru
Russian Federation, Zelenograd, Moscow, 124482
P. S. Dorozhkin
NT-MDT Co., build. 317-A; Skolkovo Institute of Science and Technology
Email: shelaev@ntmdt.ru
Russian Federation, Zelenograd, Moscow, 124482; ul. Nobelya 3, Moscow, 143026
V. A. Bykov
NT-MDT Co., build. 317-A
Email: shelaev@ntmdt.ru
Russian Federation, Zelenograd, Moscow, 124482
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