Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation

Аннотация

Photopolymer materials based on new polyacryl monomers of acrylate and mixed acrylate–acrylamide types have been obtained. Crosslinked films based on the synthesized monomers have been prepared by photopolymerization, and the thermomechanical properties of the crosslinked films have been studied. The storage modulus of the photopolymer films were determined at room temperature (1.3 and 1.5 GPa) and the glass transition temperature (82–93°С). High-aspect-ratio microstructures have been written using synchrotron radiation (SR) at the VEPP-3 storage ring (electron energy, 2 GeV) of a LIGA station at the Budker Institute of Nuclear Physics, SB RAS. It has been revealed that a synchrotron radiation dose of 1–15 J/cm³ results in polymerization of the monomers. The dependence of the thickness of a given microstructure on the absorbed SR dose has been found, and the corresponding characteristic curve has been constructed. Microstructures with an aspect ratio of 1 : 25 have been obtained.