Modification of the structure and properties of tin–fullerite films irradiated by boron ions

Аннотация

By SEM, AFM, electrostatic force microscopy, and X-ray diffraction methods, the structure, phase composition, and local electrical properties of tin–fullerite films implanted with B⁺ ions (E = 80 keV, F = 5 × 10¹⁷ ions/cm^–2) are investigated. Ion mixing and solid- phase interaction of tin and fullerite layers are found to occur under ion implantation, and a heterophase structure with nonuniform local electrical properties is formed at the same time.