Synthesis of thioether-containing carbosilane dendrimers with sterically shielded sulfur atoms

А. N. Tarasenkov; E. V. Getmanova; E. A. Tatarinova; М. I. Buzin; N. V. Demchenko; G. V. Cherkaev; А. М. Muzafarov

doi:10.1007/s11172-017-1940-3

Synthesis of thioether-containing carbosilane dendrimers with sterically shielded sulfur atoms

作者: Tarasenkov А.N.¹, Getmanova E.V.¹, Tatarinova E.A.¹, Buzin М.I.², Demchenko N.V.¹, Cherkaev G.V.¹, Muzafarov А.М.²
隶属关系:
1. N. S. Enikolopov Institute of Synthetic Polymer Materials, Russian Academy of Sciences
2. A. N. Nesmeyanov Institute of Organoelement Compounds, Russian Academy of Sciences
期: 卷 66, 编号 9 (2017)
页面: 1675-1685
栏目: Full Articles
URL: https://bakhtiniada.ru/1066-5285/article/view/241299
DOI: https://doi.org/10.1007/s11172-017-1940-3
ID: 241299

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详细

Carbosilane thiols were synthesized as the first- and second-generation (in silicon) dendrons. It was demonstrated that the resulting bulky thiols successfully undergo the thiol—ene addition to third-generation polyallyl carbosilane dendrimer as a photoinitiated radical reaction to give the corresponding thioether-containing derivatives with sterically shielded sulfur atoms.