Studying the Surface Conductivity of a Thallium Bilayer on Si(111) Substrate after Adsorption of Lithium and Rubidium
- Autores: Ryzhkova M.V.1, Borisenkoa E.A.1, Ivanchenko M.V.1,2, Tsukanov D.A.1,2, Zotov A.V.1,2, Saranin A.A.1,2
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Afiliações:
- Institute of Automation and Control Processes, Far East Branch
- Far Eastern Federal University
- Edição: Volume 44, Nº 5 (2018)
- Páginas: 412-415
- Seção: Article
- URL: https://bakhtiniada.ru/1063-7850/article/view/207645
- DOI: https://doi.org/10.1134/S1063785018050255
- ID: 207645
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Resumo
Changes in the state of a thallium bilayer on Si(111) substrate, Si(111)6 × 6–Tl, after adsorption of lithium and rubidium were studied using low-energy electron-diffraction and four-point probe-conductivity measurements. New surface reconstructions 5 × 1 and \(5\sqrt 3 \times 5\sqrt 3 \) were observed after the adsorption of lithium, and 2 × 2 and \(\sqrt 3 \times \sqrt 3 \) reconstructions appeared after the adsorption of rubidium. The surface conductivity of silicon substrates was studied as a function of the dose of deposited adsorbate. It is established that the formation of both 5 × 1 and 2 × 2 reconstructions retains the conducting properties of a two-dimensional channel constituted by the thallium bilayer.
Sobre autores
M. Ryzhkova
Institute of Automation and Control Processes, Far East Branch
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041
E. Borisenkoa
Institute of Automation and Control Processes, Far East Branch
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041
M. Ivanchenko
Institute of Automation and Control Processes, Far East Branch; Far Eastern Federal University
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041; Vladivostok, 690950
D. Tsukanov
Institute of Automation and Control Processes, Far East Branch; Far Eastern Federal University
Autor responsável pela correspondência
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041; Vladivostok, 690950
A. Zotov
Institute of Automation and Control Processes, Far East Branch; Far Eastern Federal University
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041; Vladivostok, 690950
A. Saranin
Institute of Automation and Control Processes, Far East Branch; Far Eastern Federal University
Email: tsukanov@iacp.dvo.ru
Rússia, Vladivostok, 690041; Vladivostok, 690950
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