Magnetoimpedance Effect in a SOI-Based Structure


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This paper presents the results of the study the transport properties of the SOI-based structure. Measurements were carried out on an alternating current with an external magnetic field in a wide temperature range. The influence of the magnetic field was found. We associate this effect with the influence on the surface states located at the interface, this appears as a change of the energy of their levels. This effect is enhanced by the nanoscale of the silicon channel.

Sobre autores

D. Smolyakov

Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences

Autor responsável pela correspondência
Email: sda88@iph.krasn.ru
Rússia, Krasnoyarsk, 660036

A. Tarasov

Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences

Autor responsável pela correspondência
Email: taras@iph.krasn.ru
Rússia, Krasnoyarsk, 660036

I. Yakovlev

Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences; Siberian State University of Science and Technology

Autor responsável pela correspondência
Email: yia@iph.krasn.ru
Rússia, Krasnoyarsk, 660036; Krasnoyarsk, 660014

M. Volochaev

Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences; Siberian State University of Science and Technology

Autor responsável pela correspondência
Email: volochaev91@mail.ru
Rússia, Krasnoyarsk, 660036; Krasnoyarsk, 660014

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