Мақаланы E-mail арқылы жіберу Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching
- Авторлар: Demidov E.V.1, Komarov V.A.1, Krushelnitckii A.N.1, Suslov A.V.1
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Мекемелер:
- Herzen State Pedagogical University of Russia
- Шығарылым: Том 51, № 7 (2017)
- Беттер: 840-842
- Бөлім: XV International Conference “Thermoelectrics and Their Applications—2016”, St. Petersburg, November 15–16, 2016
- URL: https://bakhtiniada.ru/1063-7826/article/view/200145
- DOI: https://doi.org/10.1134/S1063782617070065
- ID: 200145
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Аннотация
A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.
Авторлар туралы
E. Demidov
Herzen State Pedagogical University of Russia
Хат алмасуға жауапты Автор.
Email: demidov_evg@mail.ru
Ресей, St. Petersburg, 191186
V. Komarov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Ресей, St. Petersburg, 191186
A. Krushelnitckii
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Ресей, St. Petersburg, 191186
A. Suslov
Herzen State Pedagogical University of Russia
Email: demidov_evg@mail.ru
Ресей, St. Petersburg, 191186
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