Preparation of Silicon Dioxide with a Fixed Content of Fluorine from Fluorosilicic Acid
- Autores: Panasyuk G.P.1, Azarova L.A.1, Privalov V.I.1, Belan V.N.1, Voroshilov I.G.1, Shpigun L.K.1
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Afiliações:
- Kurnakov Institute of General and Inorganic Chemistry
- Edição: Volume 52, Nº 4 (2018)
- Páginas: 607-611
- Seção: Selected Articles from the Journal Khimicheskaya Tekhnologiya
- URL: https://bakhtiniada.ru/0040-5795/article/view/172198
- DOI: https://doi.org/10.1134/S0040579518040231
- ID: 172198
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Resumo
The process of obtaining silicon dioxide upon the interaction of fluorosilicic acid with an aqueous solution of ammonia is studied. The fluorine-containing compounds in synthesized dioxide are identified by 19F NMR spectroscopy. It is shown that the two-stage method of precipitation followed by washing, allows producing silicon dioxide with a fluorine content of units of ppm.
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Sobre autores
G. Panasyuk
Kurnakov Institute of General and Inorganic Chemistry
Autor responsável pela correspondência
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
L. Azarova
Kurnakov Institute of General and Inorganic Chemistry
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
V. Privalov
Kurnakov Institute of General and Inorganic Chemistry
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
V. Belan
Kurnakov Institute of General and Inorganic Chemistry
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
I. Voroshilov
Kurnakov Institute of General and Inorganic Chemistry
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
L. Shpigun
Kurnakov Institute of General and Inorganic Chemistry
Email: panasyuk@igic.ras.ru
Rússia, Moscow, 119991
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