Microstructure and Physicomechanical Properties of a Cu-8 at % Pd Alloy


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

The evolution of the structure, microhardness, and electrical resistivity has been studied during prolonged low-temperature annealings of the Cu-8 at % Pd alloy. An increase in the microhardness and electrical resistivity after annealings at temperatures of 250 and 300°C has been revealed; the preliminary deformation significantly accelerates and enhances this effect; and the X-ray diffraction patterns remain unchanged and correspond to an fcc solid solution. Using transmission electron microscopy, the state of an atomic short-range order has been detected in the quenched alloy; prolonged annealings of the deformed alloy lead to the formation of microregions of the ordered L12 phase.

Авторлар туралы

A. Volkov

Mikheev Institute of Metal Physics, Ural Branch

Хат алмасуға жауапты Автор.
Email: volkov@imp.uran.ru
Ресей, ul. S. Kovalevskoi 18, Ekaterinburg, 620137

A. Kostina

Mikheev Institute of Metal Physics, Ural Branch

Email: volkov@imp.uran.ru
Ресей, ul. S. Kovalevskoi 18, Ekaterinburg, 620137

E. Volkova

Mikheev Institute of Metal Physics, Ural Branch

Email: volkov@imp.uran.ru
Ресей, ul. S. Kovalevskoi 18, Ekaterinburg, 620137

O. Novikova

Mikheev Institute of Metal Physics, Ural Branch

Email: volkov@imp.uran.ru
Ресей, ul. S. Kovalevskoi 18, Ekaterinburg, 620137

B. Antonov

Institute of High-Temperature Electrochemistry, Ural Branch

Email: volkov@imp.uran.ru
Ресей, ul. Akademicheskaya 20, Ekaterinburg, 620137

Қосымша файлдар

Қосымша файлдар
Әрекет
1. JATS XML

© Pleiades Publishing, Ltd., 2017