Formation of channel optical waveguides in polymethylmethacrylate with embedded electro-optic chromophore DR13 by the photoinduced bleaching method
- Authors: Sokolov V.I.1,2, Akhmanov A.S.1,2, Asharchuk I.M.1, Goryachuk I.O.1, Khaydukov K.V.1, Nazarov M.M.1,3
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Affiliations:
- Institute of Photonic Technology, Federal Research Center Crystallography and Photonics
- Federal Scientific Center Scientific Research Institute for System Studies
- National Research Center Kurchatov Institute
- Issue: Vol 122, No 3 (2017)
- Pages: 469-474
- Section: Condensed-Matter Spectroscopy
- URL: https://bakhtiniada.ru/0030-400X/article/view/165353
- DOI: https://doi.org/10.1134/S0030400X17030171
- ID: 165353
Cite item
Abstract
A composite polymeric material based on polymethylmethacrylate (PMMA) with embedded electro- optical (EO) chromophore DR13 is designed. Irradiation with electromagnetic radiation in the visible range leads to a bleaching of the composite and its refractive index n decreases due to the irreversible photodestruction of the chromophore. Changes in the absorption spectrum and refractive index of the composite with the irradiation time are measured. It is shown that the change in n depends on the concentration of DR13 in the polymer matrix and can reach a value of Δn = 0.034 in the telecommunication C-range near a wavelength of 1.55 μm. The rate of bleaching depends on the wavelength of the actinic light and reaches its maximum when the wavelength is near the maximum of chromophore absorption. With the use of the photobleaching method and the PMMA/DR13 composite, channel waveguides and the other elements of the integrated optical devices are fabricated, including waveguide splitters, directional couplers, and Mach–Zehnder interferometers. This simple one-step method does not involve the removal of polymer material by liquidphase or reactive ion etching.
About the authors
V. I. Sokolov
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics; Federal Scientific Center Scientific Research Institute for System Studies
Author for correspondence.
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840; Moscow, 117218
A. S. Akhmanov
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics; Federal Scientific Center Scientific Research Institute for System Studies
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840; Moscow, 117218
I. M. Asharchuk
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840
I. O. Goryachuk
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840
K. V. Khaydukov
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840
M. M. Nazarov
Institute of Photonic Technology, Federal Research Center Crystallography and Photonics; National Research Center Kurchatov Institute
Email: visokol@rambler.ru
Russian Federation, Moscow, Troitsk, 108840; Moscow, 123182
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