A silicon field-effect hall sensor with an extended operating temperature range
- Авторы: Leonov A.V.1, Malykh A.A.1, Mordkovich V.N.1, Pavlyuk M.I.2
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Учреждения:
- Institute of Microelectronics Technology and High Purity Materials
- JSC ICC Milandr
- Выпуск: Том 59, № 5 (2016)
- Страницы: 724-727
- Раздел: General Experimental Techniques
- URL: https://bakhtiniada.ru/0020-4412/article/view/159295
- DOI: https://doi.org/10.1134/S0020441216050109
- ID: 159295
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Аннотация
The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.
Об авторах
A. Leonov
Institute of Microelectronics Technology and High Purity Materials
Email: mord36@mail.ru
Россия, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
A. Malykh
Institute of Microelectronics Technology and High Purity Materials
Email: mord36@mail.ru
Россия, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
V. Mordkovich
Institute of Microelectronics Technology and High Purity Materials
Автор, ответственный за переписку.
Email: mord36@mail.ru
Россия, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
M. Pavlyuk
JSC ICC Milandr
Email: mord36@mail.ru
Россия, Georgievskii pr. 5, Zelenograd, Moscow, 124498
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