A High-Current Electron Gun Integrated with a Magnetron Sputtering System


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Resumo

The description and the main performance specifications are presented for a device in which a high-current electron gun and a magnetron sputtering system are integrated in a common casing. This device is efficient for surface alloying on metallic materials. It is shown that the magnetic system of the magnetron does not degrade the characteristics of an electron beam that is formed in the gun and passed through a hole in the magnetron sputtering system.

Sobre autores

P. Kiziridi

Institute of High Current Electronics, Siberian Branch

Email: info@pleiadesonline.com
Rússia, Tomsk, 634055

A. Markov

Institute of High Current Electronics, Siberian Branch

Email: info@pleiadesonline.com
Rússia, Tomsk, 634055

G. Ozur

Institute of High Current Electronics, Siberian Branch

Email: info@pleiadesonline.com
Rússia, Tomsk, 634055

A. Padey

Institute of High Current Electronics, Siberian Branch

Email: info@pleiadesonline.com
Rússia, Tomsk, 634055

E. Yakovlev

Institute of High Current Electronics, Siberian Branch

Email: info@pleiadesonline.com
Rússia, Tomsk, 634055

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